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EBR Drip Defect
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Microtronic is a leader in Semiconductor Wafer Defect Inspection, Sorting and Metrology.
EBR Drip Defect
EBR Drip Defect
EBR drip, sometimes called the “eyelash” semiconductor wafer macro defect, may occur at a very low frequency possibly effecting a single semiconductor wafer in a lot at a rate of just 1-2 lots per day.
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Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
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