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|Defect Library
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31 December 31, 2015

Reticle Tilt Defect

31 December 31, 2015

Spin Defect – Line

31 December 31, 2015

Spin Defect – Entire Wafer

31 December 31, 2015

Spin Defect on Edge

31 December 31, 2015

Center Spin Macro Defect

31 December 31, 2015

Scratches By Machine

31 December 31, 2015

Scratches By Human

31 December 31, 2015

Rework – Yield Improvement

31 December 31, 2015

Rework – Scrap Avoidance

31 December 31, 2015

Previous Layer Defects

31 December 31, 2015

Partial Pattern – No Expose

31 December 31, 2015

Poly Haze Macro Defect

31 December 31, 2015

Particle Defects

31 December 31, 2015

Missing Patterns

31 December 31, 2015

Lens Stepper Macro Defects

31 December 31, 2015

Wafer Hotspot Defects

31 December 31, 2015

First 12 Wafers – Different

31 December 31, 2015

Flashfield Defects

31 December 31, 2015

Wafer Edge Discoloration

31 December 31, 2015

Developer Related Defects

31 December 31, 2015

EBR Drip Defect

31 December 31, 2015

Wafer Contamination – Small

31 December 31, 2015

Wafer Contamination – Large

31 December 31, 2015

CMP – Macro Defects

31 December 31, 2015

Edge Chips – Macro Defects

31 December 31, 2015

Poor Rinse – Macro Defect

31 December 31, 2015

Blocked Etch Macro Defect

31 December 31, 2015

Backside Contamination

7 December 7, 2015

2 Chamber Macro Defect

7 December 7, 2015

Arcing Defects

7 December 7, 2015

3 Chamber Macro Defect